Application: Crucible with high purity and high temperature stability for silicon ingot growth

Material: High purity silica (quartz) sands

Feature:
High purity for semiconductor applications

Applications: quartz chamber, upper/bottom dome, and susceptors with SiC coating
Material: high purity fused quartz and CVD coating

Features:
• High purity
• Excellent chemical resisitance

Applications: Tube, boat, pedstal that made of fused quartz or silicon carbide ceramics for oxidation and deposition Processing.

Material: High purity fused quartz, high purity silicon carbide ceramic

Features:
High purity
High temperature stability (up to 1350℃ for silicon carbide)
Less particle generation

Applications: Elements for plasma etching processing.

Mateiral:
Fused quartz: Top ring, Bottom ring, Edge ring...
Solid CVD SiC: Focus ring

Features:
High purity
Excellent plasma durability